CNI – Compact Nanoimprint Tool

CNI v2.1 edition

A desktop nanoimprint tool, for easy replication of micro- and nanoscale structures.

The starting point for nano-replication

The CNI is a desktop size tool for nanoimprint and hot embossing. It allows for replication of micro- and nanostructures from a master to a substrate. The CNI tool can perform both thermal replication and UV replication.

The tool is available in a 100 mm version that supports masters and substrates up to 100 mm diameter, and a 150 mm version that supports thermal processing on masters and substrates up to 150 mm, and UV processing of masters and substrates up to 200 mm diameter.

The CNI tool is the perfect starting point for nanoimprint, but it also supports mature and advanced development work. The CNI tool is simple to operate, it is robust and facilitates non-standard processes and new experiments.

- Nanoimprint (thermal and UV)

- Up to 200 mm diameter substrates with UV

- Up to 150×150 mm substrates with thermal processing

- Hot embossing

- Easy and intuitive operation

- Versatile usage

- Plug-and-play

- Designed for R&D

Benefits

- Easy to install Plug and play in less than 20 minutes

- Excellent With its thermal and UV replication capabilities, in vacuum if needed, the CNI tool is unique in its offering and supports many different technologies and processes

- Easy to use Everyone can use it ! (You will probably never read the manual)

- Compact size 25 x 28 x 16 cm (size of imprint chamber) 40 x 25 x 9.5 cm (up to three control modules) 1 laptop

- Attractive offer CNI is compact and has no need for fixed installation

- High quality imprints Capable of replicating structures from smaller than 40 nm to structures larger than 100 µm

- Versatile You can work with any size of stamp and substrates up to 200 mm (8-inch) round formats in UV or up to 150x150 mm substrates (rounded to max 200 mm diameter)

- Support We assist our clients in obtaining good results, offering individual support with focus on your processing needs.

Features

- A desktop size nanoimprint tool.

- Thermal NIL up to 240ºC

- UV NIL @ 365 nm

- Imprint pressure from 0.3 to 11 bar

- Imprint in vacuum (1 mbar)

- Stamp and substrate size: Up to 200 mm diameter

- No fixed format for stamps and substrates

- Robust and simple to use

- Manual load and unload of stamp and substrate

- Automatic process control

- Easy to operate software interface

- Logging of all recipes and processes

Application

- Thermal nanoimprint

- UV nanoimprint

- Hot embossing

- µ-contact printing

- Polymer bonding

Examples of use include

- Imprint of nanostructures

- Imprint of microstructures

- Imprint of gratings with nm pitch on silicon

- Imprint on fragile substrates (e.g. III-V materials, InP)

- Production of working stamps

- Hot embossing of high aspect ratio structures

- Hot embossing of polymer sheets

- Thermal polymer bonding

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